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Technology in retention
The precurser for chemical vapor deposition
New precurser search
Synthesis and analysis of organometallic compound
Vapor pressure measurement of organometallic compound
Inactivation (stabilization) of organometallic compound
Analysis of deposition mechanism
Pyrolysis experiment, mixing experiment of precurser compound
Shape, pressure and flow rate variation of the reaction chamber
Deposition to various substrates
Deposition with chemical vapor deposition equipment
Al, Cu, Ni, NiSi, NiPt, Pt metal film, barrier metal film
Al2O3, HfO2, HfSiO2, oxide film, nitride film, carbide film
Raising or lowering deposition temperature
Amorphization of the film
Design/production of chemical vapor deposition equipment
Atmospheric pressure, low pressure, hot wall, cold wall
Filament (cat.), small chemical vapor deposition equipment
Transportation method of low vapor pressure precurser
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